| Three-dimensional radio-frequency transformers based on a self-rolled-up membrane platform W Huang, J Zhou, PJ Froeter, K Walsh, S Liu, MD Kraman, M Li, ... Nature Electronics 1 (5), 305-313, 2018 | 80 | 2018 |
| Control of the Interface Between Electron‐Hole and Electron‐Ion Plasmas: Hybrid Semiconductor‐Gas Phase Devices as a Gateway for Plasma Science PA Tchertchian, CJ Wagner, TJ Houlahan Jr, B Li, DJ Sievers, JG Eden Contributions to Plasma Physics 51 (10), 889-905, 2011 | 41 | 2011 |
| Monolithic mtesla-level magnetic induction by self-rolled-up membrane technology W Huang, Z Yang, MD Kraman, Q Wang, Z Ou, MM Rojo, AS Yalamarthy, ... Science advances 6 (3), eaay4508, 2020 | 40 | 2020 |
| Producing silicon carbide micro and nanostructures by plasma‐free metal‐assisted chemical etching JA Michaels, L Janavicius, X Wu, C Chan, HC Huang, S Namiki, M Kim, ... Advanced Functional Materials 31 (32), 2103298, 2021 | 28 | 2021 |
| Monolithic radio frequency SiNx self-rolled-up nanomembrane interdigital capacitor modeling and fabrication L Sang, H Zhou, Z Yang, MD Kraman, H Zhao, JA Michaels, DJ Sievers, ... Nanotechnology 30 (36), 364001, 2019 | 18 | 2019 |
| Flexible hybrid plasma-semiconductor transistors and arrays JG Eden, PA Tchertchian, TJ Houlahan, DJ Sievers, B Li, CJ Wagner US Patent 8,816,435, 2014 | 17 | 2014 |
| Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin … AE Mironov, J Kim, Y Huang, AW Steinforth, DJ Sievers, JG Eden Nanoscale 12 (32), 16796-16804, 2020 | 16 | 2020 |
| Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing LL Janavicius, JA Michaels, C Chan, DJ Sievers, X Li Applied Physics Reviews 10 (1), 2023 | 11 | 2023 |
| Commercialization of microcavity plasma devices and arrays: Systems for VUV photolithography and nanopatterning, disinfection of drinking water and air, and biofilm … J Kim, AE Mironov, JH Cho, DS Sievers, CM Herring, S Park, PP Sun, ... Plasma Processes and Polymers 19 (10), 2200075, 2022 | 7 | 2022 |
| Effect of Perforation on the Thermal and Electrical Breakdown of Self‐Rolled‐Up Nanomembrane Structures JA Michaels, DR Wood, PJ Froeter, W Huang, DJ Sievers, X Li Advanced Materials Interfaces 6 (21), 1901022, 2019 | 7 | 2019 |
| Photoablative lithography of cellulose acetate at 172 nm: Subtractive 3D printing of biodegradable optical microstructures and molds for polydimethylsiloxane patterning AE Mironov, S Park, J Kim, DJ Sievers, SJ Park, S Spirk, JG Eden APL Materials 9 (11), 2021 | 5 | 2021 |
| Plasma‐Damage Free Efficiency Scaling of Micro‐LEDs by Metal‐Assisted Chemical Etching CY Chan, HC Roberts, Y Xiao, PJ Froeter, DJ Sievers, Z Mi, X Li Advanced Optical Materials, 2302957, 2024 | 1 | 2024 |
| Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications AE Mironov, S Park, T Reboli, J Kim, DJ Sievers, SJ Park, JG Eden UV and Higher Energy Photonics: From Materials to Applications 2021 11801 …, 2021 | 1 | 2021 |
| Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga2O3 thin film with flexible DUV photodetector J Kim, AE Mironov, DJ Sievers, S Park, JG Eden CLEO: Applications and Technology, JTu3A. 86, 2021 | 1 | 2021 |
| Flexible and on wafer hybrid plasma-semiconductor transistors JG Eden, PA Tchertchian, CJ Wagner, DJ Sievers, TJ Houlahan, B Li US Patent 9,184,341, 2015 | 1 | 2015 |
| Uniform broad-area deposition and patterning of SiO2 nanofilms by 172 nm photochemical conversion of liquid tetraethoxysilane layers at 300 K J Kim, DJ Sievers, AE Mironov, SJ Park, JG Eden APL Materials 12 (1), 2024 | | 2024 |
| Publisher's Note:“Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing”[Appl. Phys. Rev. 10, 011409 (2023)] LL Janavicius, JA Michaels, C Chan, DJ Sievers, X Li Applied Physics Reviews 10 (2), 029901, 2023 | | 2023 |
| Photoresist-free deposition and patterning with vacuum ultraviolet lamps JG Eden, A Mironov, DJ Sievers US Patent App. 17/612,830, 2022 | | 2022 |
| Methods and systems for large area and low defect monolayer ordering of microspheres and nanospheres D Sievers, S Grewal, L Janavicius, J Michaels US Patent App. 17/558,996, 2022 | | 2022 |
| Photoresist-free photolithography, photoprocessing tools, and methods with vuv or deep-uv lamps JG Eden, D Sievers, A Mironov, J Kim US Patent App. 17/268,276, 2021 | | 2021 |
Xiuling LiUniversity of Texas at AustinVerified email at utexas.edu
