| Global Model ofHigh-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP R Chanson, A Rhallabi, MC Fernandez, C Cardinaud, S Bouchoule, ... IEEE Transactions on Plasma Science 40 (4), 959-971, 2012 | 20 | 2012 |
| Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above− 50° C R Chanson, L Zhang, S Naumov, YA Mankelevich, T Tillocher, ... Scientific reports 8 (1), 1886, 2018 | 17 | 2018 |
| X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl2-based inductively coupled plasma R Chanson, S Bouchoule, C Cardinaud, C Petit-Etienne, E Cambril, ... Journal of Vacuum Science & Technology B 32 (1), 2014 | 10 | 2014 |
| Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach A Zotovich, A Rezvanov, R Chanson, L Zhang, N Hacker, K Kurchikov, ... Journal of Physics D: Applied Physics 51 (32), 325202, 2018 | 9 | 2018 |
| Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution R Chanson, A Rhallabi, MC Fernandez, C Cardinaud Plasma Processes and Polymers 10 (3), 213-224, 2013 | 7 | 2013 |
| Modeling of inductively coupled plasma Ar/Cl2/N2 plasma discharge: Effect of N2 on the plasma properties R Chanson, A Rhallabi, MC Fernandez, C Cardinaud, JP Landesman Journal of Vacuum Science & Technology A 31 (1), 2013 | 7 | 2013 |
| Cathodoluminescence study of InP photonic structures fabricated by dry etching R Chanson, A Martin, M Avella, J Jiménez, F Pommereau, JP Landesman, ... Journal of electronic materials 39, 688-693, 2010 | 7 | 2010 |
| Atomic scale study of InP etching by Cl2-Ar ICP plasma discharge A Rhallabi, R Chanson, JP Landesman, C Cardinaud, MC Fernandez The European Physical Journal-Applied Physics 53 (3), 33606, 2011 | 6 | 2011 |
| Surface chemistry of InP ridge structures etched in Cl2-based plasma analyzed with angular XPS S Bouchoule, R Chanson, A Pageau, E Cambril, S Guilet, A Rhallabi, ... Journal of Vacuum Science & Technology A 33 (5), 2015 | 5 | 2015 |
| Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics JF Marneffe, T Yamaguchi, M Fujikawa, A Rezvanov, R Chanson, J Zhang, ... ACS Applied Electronic Materials 1 (12), 2602-2611, 2019 | 4 | 2019 |
| Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation R Chanson, R Dussart, T Tillocher, P Lefaucheux, C Dussarrat, ... Frontiers of Chemical Science and Engineering 13, 511-516, 2019 | 4 | 2019 |
| Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3 R Chanson, S Tahara, K Vanstreels, JF de Marneffe Plasma Research Express 1 (1), 015006, 2018 | 4 | 2018 |
| Gravure de l’InP par plasma ICP chloré et HBr/Ar: Modélisation multiéchelle et analyse XPS R Chanson Nantes, 2012 | 2 | 2012 |
| Novel volatile film for the protection of organo-silicate glass dielectric materials M Fujikawa, T Yamaguchi, S Nozawa, Y Kikuchi, K Maekawa, H Kawasaki, ... IEEE Transactions on Semiconductor Manufacturing 32 (4), 438-443, 2019 | 1 | 2019 |
| Gas Phase Pore Stuffing for the protection of organo-silicate glass dielectric materials M Fujikawa, JF de Marneffe, R Chanson, KB Gavan, A Rezvanov, ... 2018 International Symposium on Semiconductor Manufacturing (ISSM), 1-3, 2018 | 1 | 2018 |
| Gas phase pore stuffing (GPPS) M Fujikawa, T Yamaguchi, S Nozawa, R Niino, R Chanson, KB Gavan, ... 2018 IEEE International Interconnect Technology Conference (IITC), 129-131, 2018 | 1 | 2018 |
| Low-k integration: Gas screening for cryogenic etching and damage mitigation R Chanson, R Dussart, T Tillocher, P Lefaucheux, C Dussarrat, ... | | 2019 |
| A Novel Volatile Film for Dielectric Plasma Damage Protection JF de Marneffe, A Rezvanov, R Chanson, K Babaei Gavan, M Fujikawa, ... | | 2019 |
| IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING CONFERENCE PROCEEDINGS M Fujikawa, T Yamaguchi, S Nozawa, JF De Marneffe, R Chanson, ... | | 2019 |
| Etch process cleaning to improve wafer to wafer reproducibility T Chevolleau, C Petit-Etienne, G Cunge, E Pargon, L Vallier, N Posseme, ... ENRIS 2019 (European Nanofabrication Research Infrastructure Symposium), 2019 | | 2019 |
