Alexey Kovalgin
Alexey Kovalgin
Associate Professor, University of Twente, Enschede, NL
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Cited by
Cited by
Semiconductor processing apparatus with compact free radical source
AY Kovalgin, AAI Aarnink
US Patent App. 13/918,094, 2013
Selective deposition of tungsten
AY Kovalgin, M Yang, AAI Aarnink, RAM Wolters
US Patent 10,714,385, 2020
Selective deposition of tungsten
AY Kovalgin, M Yang, AAI Aarnink, RAM Wolters
US Patent App. 16/926,192, 2020
CO interaction with the surface of thermally activated CaO and MgO
MA Babaeva, DS Bystrov, AY Kovalgin, AA Tsyganenko
Journal of Catalysis 123 (2), 396-416, 1990
Systematic TLM measurements of NiSi and PtSi specific contact resistance to n-and p-type Si in a broad doping range
N Stavitski, MJH Van Dal, A Lauwers, C Vrancken, AY Kovalgin, ...
IEEE electron device letters 29 (4), 378-381, 2008
Growth kinetics and oxidation mechanism of ALD TiN thin films monitored by in situ spectroscopic ellipsometry
H Van Bui, AW Groenland, AAI Aarnink, RAM Wolters, J Schmitz, ...
Journal of the Electrochemical Society 158 (3), H214, 2011
Cross-bridge Kelvin resistor structures for reliable measurement of low contact resistances and contact interface characterization
N Stavitski, JH Klootwijk, HW van Zeijl, AY Kovalgin, RAM Wolters
IEEE transactions on semiconductor manufacturing 22 (1), 146-152, 2009
On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films
H Van Bui, AY Kovalgin, RAM Wolters
Applied surface science 269, 45-49, 2013
Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
H Van Bui, FB Wiggers, A Gupta, MD Nguyen, AAI Aarnink, MP de Jong, ...
Journal of Vacuum Science & Technology A 33 (1), 2015
From Single Atoms to Nanoparticles: Autocatalysis and Metal Aggregation in Atomic Layer Deposition of Pt on TiO2 Nanopowder
F Grillo, H Van Bui, D La Zara, AAI Aarnink, AY Kovalgin, P Kooyman, ...
Small 14 (23), 1800765, 2018
Self-limiting growth and thickness-and temperature-dependence of optical constants of ALD AlN thin films
H Van Bui, MD Nguyen, FB Wiggers, AAI Aarnink, MP de Jong, ...
ECS journal of solid state science and technology 3 (4), P101, 2014
Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry
AY Kovalgin, M Yang, S Banerjee, RO Apaydin, AAI Aarnink, S Kinge, ...
Advanced materials interfaces 4 (18), 1700058, 2017
Integration of solar cells on top of CMOS chips part I: A-Si solar cells
J Lu, AY Kovalgin, KHM van der Werf, REI Schropp, J Schmitz
IEEE transactions on electron devices 58 (7), 2014-2021, 2011
Evaluation of transmission line model structures for silicide-to-silicon specific contact resistance extraction
N Stavitski, MJH Van Dal, A Lauwers, C Vrancken, AY Kovalgin, ...
IEEE transactions on electron devices 55 (5), 1170-1176, 2008
Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD
A Boogaard, AY Kovalgin, I Brunets, AAI Aarnink, J Holleman, ...
Surface and Coatings Technology 201 (22-23), 8976-8980, 2007
PEALD AlN: Controlling growth and film crystallinity
S Banerjee, AAI Aarnink, R van de Kruijs, AY Kovalgin, J Schmitz
physica status solidi (c) 12 (7), 1036-1042, 2015
Interaction of epitaxial silicene with overlayers formed by exposure to Al atoms and O2 molecules
R Friedlein, H Van Bui, FB Wiggers, Y Yamada-Takamura, AY Kovalgin, ...
The Journal of Chemical Physics 140 (20), 2014
Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (SilcoreŽ) embedded in ALD-alumina for non-volatile memory devices
I Brunets, AAI Aarnink, A Boogaard, AY Kovalgin, RAM Wolters, ...
Surface and coatings technology 201 (22-23), 9209-9214, 2007
Chemical modeling of a high-density inductively-coupled plasma reactor containing silane
AY Kovalgin, A Boogaard, I Brunets, J Holleman, J Schmitz
Surface and coatings technology 201 (22-23), 8849-8853, 2007
Conduction and electric field effect in ultra-thin TiN films
H Van Bui, AY Kovalgin, J Schmitz, RAM Wolters
Applied physics letters 103 (5), 2013
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