Follow
lynn rathbun
lynn rathbun
Cornell Nanoscale Facility
Verified email at cnf.cornell.edu - Homepage
Title
Cited by
Cited by
Year
Microlithographic array for macromolecule and cell fractionation
RH Austin, WD Volkmuth, LC Rathbun
US Patent 5,837,115, 1998
2461998
Photoluminescence of AlxGa1−xAs grown by molecular beam epitaxy
G Wicks, WI Wang, CEC Wood, LF Eastman, L Rathbun
Journal of Applied Physics 52 (9), 5792-5796, 1981
1541981
On the origin and elimination of macroscopic defects in MBE films
CEC Wood, L Rathbun, H Ohno, D DeSimone
Journal of Crystal Growth 51 (2), 299-303, 1981
1011981
GaInAs‐AlInAs structures grown by molecular beam epitaxy
H Ohno, CEC Wood, L Rathbun, DV Morgan, GW Wicks, LF Eastman
Journal of Applied Physics 52 (6), 4033-4037, 1981
961981
Halide formation and etching of Cu thin films with Cl2 and Br2
S Park, TN Rhodin, LC Rathbun
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (2 …, 1986
461986
Dry development of ion beam exposed PMMA resist
I Adesida, JD Chinn, L Rathbun, ED Wolf
Journal of Vacuum Science and Technology 21 (2), 666-671, 1982
371982
Physical and materials limitations on burnout voltage of GaAs power MESFET's
S Tiwari, LF Eastman, L Rathbun
IEEE Transactions on Electron Devices 27 (6), 1045-1054, 1980
321980
A critical discussion of emission mechanisms and reaction rates for the ion‐assisted etching of GaAs (100)
WL O’Brien, CM Paulsen‐Boaz, TN Rhodin, LC Rathbun
Journal of applied physics 64 (11), 6523-6529, 1988
311988
New technique and analysis of accelerated electromigration life testing in multilevel metallizations
LP Muray, LC Rathbun, ED Wolf
Applied physics letters 53 (15), 1414-1416, 1988
291988
Very low resistance Au/Ge/Ni/Ag based Ohmic contact formation to Al0.25/Ga0.75As/GaAs and Al0.48In0.52As/Ga0.47In0.53As heterostructures: A behavioral …
P Zwicknagl, SD Mukherjee, PM Capani, H Lee, HT Griem, L Rathbun, ...
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1986
281986
Molecular‐beam epitaxial group III arsenide alloys: Effect of substrate temperature on composition
CEC Wood, DV Morgan, L Rathbun
Journal of Applied Physics 53 (6), 4524-4526, 1982
271982
Interfacial reaction between a Ni/Ge bilayer and silicon (100)
J Li, QZ Hong, JW Mayer, L Rathbun
Journal of applied physics 67 (5), 2506-2511, 1990
261990
Effect of inert ion bombardment on chemisorption and etching of aluminum films in Cl2, Br2, CCl4, and CBr4
S Park, LC Rathbun, TN Rhodin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985
251985
Extremal Effects in Rotationally Inelastic Diffraction from Crystal Surfaces
RG Rowe, L Rathbun, G Ehrlich
Physical Review Letters 35 (16), 1104, 1975
251975
Electrical and structural characteristics of thin nitrided gate oxides prepared by rapid thermal nitridation
J Nulman, JP Krusius, L Rathbun
1984 International Electron Devices Meeting, 169-172, 1984
231984
Instabilities in the growth of AlxGa(1−x)As/Al/AlyGa(1−y)As structures by molecular beam epitaxy
K Okamoto, CEC Wood, L Rathbun, LF Eastman
Journal of Applied Physics 53 (3), 1532-1535, 1982
131982
Electron‐beam lithography and chemically assisted ion beam etching for the fabrication of grating surface‐emitting broad‐area AlGaAs lasers
RC Tiberio, GA Porkolab, JE Johnson, WJ Grande, LC Rathbun, ED Wolf, ...
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1990
121990
Growth of GaAs‐Al‐GaAs by migration‐enhanced epitaxy
B Tadayon, S Tadayon, MG Spencer, GL Harris, L Rathbun, JT Bradshaw, ...
Applied physics letters 53 (26), 2664-2665, 1988
121988
Low resistance alloyed ohmic contacts to Al0. 48In0. 52As/n+-Ga0. 47In0. 53As
PM Capani, SD Mukherjee, P Zwicknagl, JD Berry, HT Griem, L Rathbun, ...
Electronics Letters 11 (20), 446-447, 1984
101984
Ion‐induced chlorination of titanium leading to enhanced etching
WL O’Brien, TN Rhodin, LC Rathbun
The Journal of chemical physics 89 (8), 5264-5272, 1988
91988
The system can't perform the operation now. Try again later.
Articles 1–20