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David Simons
David Simons
Verified email at nist.gov
Title
Cited by
Cited by
Year
Secondary ion yield changes in Si and GaAs due to topography changes during O+2 or Cs+ ion bombardment
FA Stevie, PM Kahora, DS Simons, P Chi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (1 …, 1988
1951988
Transient enhanced diffusion without {311} defects in low energy B+‐implanted silicon
LH Zhang, KS Jones, PH Chi, DS Simons
Applied physics letters 67 (14), 2025-2027, 1995
1721995
Electrohydrodynamic ionization mass spectrometry-the ionization of liquid glycerol and non-volatile organic solutes
DS Simons, BN Colby, CA Evans Jr
International Journal of Mass Spectrometry and Ion Physics 15 (3), 291-302, 1974
1651974
Secondary ion mass spectrometry SIMS V: proceedings of the fifth international conference, Washington, DC, September 30–October 4, 1985
A Benninghoven, RJ Colton, DS Simons, HW Werner
Springer Science & Business Media, 2012
1442012
Al and B ion‐implantations in 6H‐and 3C‐SiC
MV Rao, P Griffiths, OW Holland, G Kelner, JA Freitas Jr, DS Simons, ...
Journal of applied physics 77 (6), 2479-2485, 1995
1281995
Evaluation of the local thermal equilibrium model for quantitative secondary ion mass spectrometric analysis
DS Simons, JE Baker, CA Evans
Analytical Chemistry 48 (9), 1341-1348, 1976
861976
Molecular ion imaging and dynamic secondary-ion mass spectrometry of organic compounds
G Gillen, DS Simons, P Williams
Analytical chemistry 62 (19), 2122-2130, 1990
851990
Mass spectrometry of solvated ions generated directly from the liquid phase by electrohydrodynamic ionization
BP Stimpson, DS Simons, CA Evans Jr
The Journal of Physical Chemistry 82 (6), 660-670, 1978
711978
Surface segregation and structure of Sb-doped Si (100) films grown at low temperature by molecular beam epitaxy
KD Hobart, DJ Godbey, ME Twigg, M Fatemi, PE Thompson, DS Simons
Surface Science 334 (1-3), 29-38, 1995
671995
Doping of gallium nitride using disilane
AE Wickenden, LB Rowland, K Doverspike, DK Gaskill, JA Freitas, ...
Journal of electronic materials 24, 1547-1550, 1995
661995
Low‐temperature cleaning processes for Si molecular beam epitaxy
PE Thompson, ME Twigg, DJ Godbey, KD Hobart, DS Simons
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1993
641993
Diffusion of ion implanted boron in preamorphized silicon
KS Jones, LH Zhang, V Krishnamoorthy, M Law, DS Simons, P Chi, ...
Applied physics letters 68 (19), 2672-2674, 1996
631996
Isotopic analysis with the laser microprobe mass analyzer
DS Simons
International journal of mass spectrometry and ion processes 55 (1), 15-30, 1983
611983
Diffusion barrier cladding in Si/SiGe resonant interband tunneling diodes and their patterned growth on PMOS source/drain regions
N Jin, SY Chung, AT Rice, PR Berger, PE Thompson, C Rivas, R Lake, ...
IEEE Transactions on Electron Devices 50 (9), 1876-1884, 2003
602003
Determination of uranium and thorium concentrations in soils: a comparison of isotope dilution-secondary ion mass spectrometry and isotope dilution-thermal ionization mass …
AG Adriaens, JD Fassett, WR Kelly, DS Simons, FC Adams
Analytical Chemistry 64 (23), 2945-2950, 1992
551992
Instrumental neutron activation analysis for certification of ion-implanted arsenic in silicon
RR Greenberg, RM Lindstrom, DS Simons
Journal of Radioanalytical and Nuclear Chemistry 245, 57-63, 2000
482000
Si resonant interband tunnel diodes grown by low-temperature molecular-beam epitaxy
PE Thompson, KD Hobart, ME Twigg, GG Jernigan, TE Dillon, ...
Applied physics letters 75 (9), 1308-1310, 1999
431999
Quantitative surface analysis of Fe Ni alloy films by XPS, AES and SIMS
KJ Kim, DW Moon, CJ Park, D Simons, G Gillen, H Jin, HJ Kang
Surface and Interface Analysis: An International Journal devoted to the …, 2007
392007
Review of secondary ion mass spectrometry characterization of contamination associated with ion implantation
FA Stevie, RG Wilson, DS Simons, MI Current, PC Zalm
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
391994
Elevated temperature nitrogen implants in 6H-SiC
J Gaedner, MV Rao, OW Holland, G Kelner, DS Simons, PH Chi, ...
Journal of electronic materials 25, 885-892, 1996
341996
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