The influence of ZnO layer thickness on the performance and electrical bias stress instability in ZnO thin film transistors DK Ngwashi, TA Mih, RBM Cross Materials Research Express 7 (2), 026302, 2020 | 11 | 2020 |
Capacitance-Voltage Analysis of ZrO2 Thin Films Deposited by Thermal MOCVD Technique TA Mih, S Paul, AP Milanov, R Bhakta, A Devi ECS Transactions 25 (8), 901, 2009 | 5 | 2009 |
A novel low-temperature growth method of silicon structures and application in flash memory. TA Mih De Montfort University, 2011 | 3 | 2011 |
A Novel Method for the growth of Low Temperature Silicon Structures for 3-D Flash Memory Devices TA Mih, RB Cross, S Paul MRS Online Proceedings Library 1112 (1), 503, 2008 | 3 | 2008 |
The impact of multi-layered dielectrics on the electrical performance of ZnO thin-film transistors DK Ngwashi, TA Mih Scientific African 20, e01653, 2023 | 2 | 2023 |
Low temperature growth of silicon structures for application in flash memory devices TA Mih, S Paul, RBM Cross MRS Online Proceedings Library (OPL) 1250, 1250-G07-04, 2010 | 1 | 2010 |
Scientific African DK Ngwashi, TA Mih | | 2023 |
Two-Terminal Low-temperature Poly-Si Thin Film Non-Volatile Memory TA Mih, S Paul International Journal of Science, Engineering and Innovative Research 3 …, 2015 | | 2015 |
Capacitance-Voltage Analysis of ZrO2 Thin Films Deposited by MOCVD Technique TA Mih, S Paul, A Milanov, A Devi ECS Meeting Abstracts, 2602, 2009 | | 2009 |
The Influence of ZnO Layer Thickness on the Performance and Electrical Bias Stress Instability in ZnO Thin Film Transistors ND Khan, TA Mih, RBM Cross | | |