Kevin S. Jones
Title
Cited by
Cited by
Year
A systematic analysis of defects in ion-implanted silicon
KS Jones, S Prussin, ER Weber
Applied Physics A 45 (1), 1-34, 1988
6151988
Three-dimensional reconstruction of porous LSCF cathodes
D Gostovic, JR Smith, DP Kundinger, KS Jones, ED Wachsman
Electrochemical and Solid State Letters 10 (12), B214, 2007
2382007
A randomized, double-blind, dose-ranging study comparing wound infiltration of DepoFoam bupivacaine, an extended-release liposomal bupivacaine, to bupivacaine HCl for …
K Bramlett, E Onel, ER Viscusi, K Jones
The Knee 19 (5), 530-536, 2012
2282012
quantum-dot infrared photodetector with operating temperature up to 260 K
L Jiang, SS Li, NT Yeh, JI Chyi, CE Ross, KS Jones
Applied physics letters 82 (12), 1986-1988, 2003
1742003
Transient enhanced diffusion without {311} defects in low energy B+‐implanted silicon
LH Zhang, KS Jones, PH Chi, DS Simons
Applied physics letters 67 (14), 2025-2027, 1995
1671995
Rapid thermal processing: science and technology
RB Fair
Academic Press, 2012
1582012
Effect of fluorine on the diffusion of boron in ion implanted Si
DF Downey, JW Chow, E Ishida, KS Jones
Applied physics letters 73 (9), 1263-1265, 1998
1381998
Evaluation of the relationship between cathode microstructure and electrochemical behavior for SOFCs
JR Smith, A Chen, D Gostovic, D Hickey, D Kundinger, KL Duncan, ...
Solid state ionics 180 (1), 90-98, 2009
1352009
Defects in microelectronic materials and devices
DM Fleetwood, RD Schrimpf
CRC press, 2008
1262008
{311} defects in silicon: The source of the loops
J Li, KS Jones
Applied Physics Letters 73 (25), 3748-3750, 1998
1191998
Direct comparison of the quantized Hall resistance in gallium arsenide and silicon
A Hartland, K Jones, JM Williams, BL Gallagher, T Galloway
Physical review letters 66 (8), 969, 1991
1081991
The effect of implant energy, dose, and dynamic annealing on end‐of‐range damage in Ge+‐implanted silicon
KS Jones, D Venables
Journal of applied physics 69 (5), 2931-2937, 1991
901991
The effect of impurities on diffusion and activation of ion implanted boron in silicon
LS Robertson, R Brindos, KS Jones, ME Law, DF Downey, S Falk, J Liu
MRS Online Proceedings Library Archive 610, 2000
892000
Nanostructured ion beam-modified Ge films for high capacity Li ion battery anodes
NG Rudawski, BL Darby, BR Yates, KS Jones, RG Elliman, AA Volinsky
Applied Physics Letters 100 (8), 083111, 2012
872012
Effects of hydrostatic pressure on dopant diffusion in silicon
H Park, KS Jones, JA Slinkman, ME Law
Journal of applied physics 78 (6), 3664-3670, 1995
861995
Study of reverse annealing behaviors of ultrashallow junction formed using solid phase epitaxial annealing
JY Jin, J Liu, U Jeong, S Mehta, K Jones
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
802002
The influence of ammonia on rapid‐thermal low‐pressure metalorganic chemical vapor deposited TiNx films from tetrakis (dimethylamido) titanium precursor onto …
A Katz, A Feingold, S Nakahara, SJ Pearton, E Lane, M Geva, FA Stevie, ...
Journal of applied physics 71 (2), 993-1000, 1992
74*1992
Ion milling damage in InP and GaAs
SJ Pearton, UK Chakrabarti, AP Perley, KS Jones
Journal of applied physics 68 (6), 2760-2768, 1990
741990
Amorphization and graphitization of single-crystal diamond—A transmission electron microscopy study
DP Hickey, KS Jones, RG Elliman
Diamond and related materials 18 (11), 1353-1359, 2009
672009
Craters on silicon surfaces created by gas cluster ion impacts
LP Allen, Z Insepov, DB Fenner, C Santeufemio, W Brooks, KS Jones, ...
Journal of applied physics 92 (7), 3671-3678, 2002
632002
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Articles 1–20