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Milanov Andrian
Milanov Andrian
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Year
Hafnium oxide thin film grown by ALD: An XPS study
D Barreca, A Milanov, RA Fischer, A Devi, E Tondello
Surface Science Spectra 14 (1), 34-40, 2007
1312007
Dry reforming and reverse water gas shift: alternatives for syngas production?
E Schwab, A Milanov, SA Schunk, A Behrens, N Schödel
Chemie Ingenieur Technik 87 (4), 347-353, 2015
1002015
Synthesis, characterization, and thermal properties of homoleptic rare-earth guanidinates: promising precursors for MOCVD and ALD of rare-earth oxide thin films
AP Milanov, RA Fischer, A Devi
Inorganic chemistry 47 (23), 11405-11416, 2008
792008
Dry reforming of methane with carbon dioxide over NiO–MgO–ZrO2
J Titus, T Roussière, G Wasserschaff, S Schunk, A Milanov, E Schwab, ...
Catalysis Today 270, 68-75, 2016
632016
Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare-earth nitride thin films
TB Thiede, M Krasnopolski, AP Milanov, T de los Arcos, A Ney, ...
Chemistry of Materials 23 (6), 1430-1440, 2011
622011
Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2
A Milanov, R Bhakta, A Baunemann, HW Becker, R Thomas, P Ehrhart, ...
Inorganic chemistry 45 (26), 11008-11018, 2006
612006
Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties
K Xu, R Ranjith, A Laha, H Parala, AP Milanov, RA Fischer, E Bugiel, ...
Chemistry of Materials 24 (4), 651-658, 2012
552012
Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal− Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films
AP Milanov, TB Thiede, A Devi, RA Fischer
Journal of the American Chemical Society 131 (47), 17062-17063, 2009
552009
Stabilization of amide-based complexes of niobium and tantalum using malonates as chelating ligands: Precursor chemistry and thin film deposition
M Hellwig, A Milanov, D Barreca, JL Deborde, R Thomas, M Winter, ...
Chemistry of Materials 19 (25), 6077-6087, 2007
542007
Sc 2 O 3, Er 2 O 3, and Y 2 O 3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors
AP Milanov, K Xu, S Cwik, H Parala, T de los Arcos, HW Becker, ...
Dalton Transactions 41 (45), 13936-13947, 2012
522012
Lanthanide oxide thin films by metalorganic chemical vapor deposition employing volatile guanidinate precursors
AP Milanov, T Toader, H Parala, D Barreca, A Gasparotto, C Bock, ...
Chemistry of Materials 21 (22), 5443-5455, 2009
512009
Growth of Crystalline Gd2O3 Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition
AP Milanov, K Xu, A Laha, E Bugiel, R Ranjith, D Schwendt, HJ Osten, ...
Journal of the American Chemical Society 132 (1), 36-37, 2010
502010
Nanostructured Dy2O3 films: an XPS investigation
D Barreca, A Gasparotto, A Milanov, E Tondello, A Devi, RA Fischer
Surface Science Spectra 14 (1), 52-59, 2007
492007
Tantalum complexes with all nitrogen coordination sphere: mixed amido-, imido-, guanidinato complexes of tantalum and their thermal behaviour
A Baunemann, D Rische, A Milanov, Y Kim, M Winter, C Gemel, ...
Dalton Transactions, 3051-3055, 2005
422005
Gd2O3 Nanostructured Thin Films Analyzed by XPS
D Barreca, A Gasparotto, A Milanov, E Tondello, A Devi, RA Fischer
Surface Science Spectra 14 (1), 60-67, 2007
352007
Thin films of HfO2 for high-k gate oxide applications from engineered alkoxide-and amide-based MOCVD precursors
R Thomas, E Rije, P Ehrhart, A Milanov, R Bhakta, A Bauneman, A Devi, ...
Journal of the Electrochemical Society 154 (3), G77, 2007
352007
Structure–activity relationships of nickel–hexaaluminates in reforming reactions part II: activity and stability of nanostructured nickel–hexaaluminate‐based catalysts in the …
T Roussière, L Schulz, KM Schelkle, G Wasserschaff, A Milanov, ...
ChemCatChem 6 (5), 1447-1452, 2014
342014
Heteroleptic Guanidinate‐ and Amidinate‐Based Complexes of Hafnium as New Precursors for MOCVD of HfO2
K Xu, AP Milanov, M Winter, D Barreca, A Gasparotto, HW Becker, A Devi
European Journal of Inorganic Chemistry 2010 (11), 1679-01688, 2010
312010
Liquid‐Injection MOCVD of ZrO2 Thin Films using Zirconium Bis(diethlyamido)‐bis(di‐tert‐butylmalonato) as a Novel Precursor
R Thomas, A Milanov, R Bhakta, U Patil, M Winter, P Ehrhart, R Waser, ...
Chemical Vapor Deposition 12 (5), 295-300, 2006
292006
Thin Films of ZrO2 for High‐k Applications Employing Engineered Alkoxide‐ and Amide‐Based MOCVD Precursors
R Thomas, R Bhakta, A Milanov, A Devi, P Ehrhart
Chemical Vapor Deposition 13 (2‐3), 98-104, 2007
272007
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