Mechanisms of oxygen plasma nanotexturing of organic polymer surfaces: from stable super hydrophilic to super hydrophobic surfaces K Tsougeni, N Vourdas, A Tserepi, E Gogolides, C Cardinaud
Langmuir 25 (19), 11748-11759, 2009
399 2009 Spectroscopic determination of the structure of amorphous nitrogenated carbon films S Bhattacharyya, C Cardinaud, G Turban
Journal of applied physics 83 (8), 4491-4500, 1998
268 1998 Plasma etching: principles, mechanisms, application to micro-and nano-technologies C Cardinaud, MC Peignon, PY Tessier
Applied Surface Science 164 (1-4), 72-83, 2000
267 2000 In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process J Pereira, LE Pichon, R Dussart, C Cardinaud, CY Duluard, ...
Applied Physics Letters 94 (7), 2009
104 2009 Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor C Charles, G Giroult‐Matlakowski, RW Boswell, A Goullet, G Turban, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (6 …, 1993
81 1993 Polyhedral oligomeric silsesquioxane (POSS) based resists: material design challenges and lithographic evaluation at 157 nm E Tegou, V Bellas, E Gogolides, P Argitis, D Eon, G Cartry, C Cardinaud
Chemistry of materials 16 (13), 2567-2577, 2004
77 2004 RF sputtered amorphous chalcogenide thin films for surface enhanced infrared absorption spectroscopy F Verger, V Nazabal, F Colas, P Němec, C Cardinaud, E Baudet, ...
Optical Materials Express 3 (12), 2112-2131, 2013
61 2013 Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma L Lallement, A Rhallabi, C Cardinaud, MC Peignon-Fernandez, LL Alves
Plasma Sources Science and Technology 18 (2), 025001, 2009
58 2009 Analyse XPS des surfaces de Si et SiO2 exposées aux plasmas de CHF3 et CHF3—C2F6. Polymérisation et gravure C Cardinaud, A Rhounna, G Turban, B Grolleau
Revue de physique appliquée 24 (3), 309-321, 1989
55 1989 Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies E Baudet, C Cardinaud, A Girard, E Rinnert, K Michel, B Bureau, ...
Journal of Non-Crystalline Solids 444, 64-72, 2016
53 2016 Studies on structural properties of amorphous nitrogenated carbon films from electron energy loss, ellipsometry, Auger electron spectroscopy, and electron-spin resonance S Bhattacharyya, C Vallee, C Cardinaud, O Chauvet, G Turban
Journal of applied physics 85 (4), 2162-2169, 1999
52 1999 Fluorine-based plasmas: main features and application in micro-and nanotechnology and in surface treatment C Cardinaud
Comptes Rendus Chimie 21 (8), 723-739, 2018
49 2018 HiPIMS ion energy distribution measurements in reactive mode PY Jouan, L Le Brizoual, M Ganciu, C Cardinaud, S Tricot, MA Djouadi
IEEE transactions on plasma science 38 (11), 3089-3094, 2010
46 2010 Experimental design approach for deposition optimization of RF sputtered chalcogenide thin films devoted to environmental optical sensors E Baudet, M Sergent, P Němec, C Cardinaud, E Rinnert, K Michel, ...
Scientific Reports 7 (1), 3500, 2017
45 2017 Plasma etching of poly (dimethylsiloxane): Roughness formation, mechanism, control, and application in the fabrication of microfluidic structures ME Vlachopoulou, G Kokkoris, C Cardinaud, E Gogolides, A Tserepi
Plasma Processes and Polymers 10 (1), 29-40, 2013
43 2013 Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication L Lallement, C Gosse, C Cardinaud, MC Peignon-Fernandez, A Rhallabi
Journal of Vacuum Science & Technology A 28 (2), 277-286, 2010
43 2010 Electronic and optical investigation of hydrogenated amorphous carbon (aC: H) by X-ray photoemission spectroscopy and spectroscopic ellipsometry J Hong, S Lee, C Cardinaud, G Turban
Journal of non-crystalline solids 265 (1-2), 125-132, 2000
42 2000 Enhanced performance of PMOS MUGFET via integration of conformal plasma-doped source/drain extensions D Lenoble, K Anil, A De Keersgieter, P Eybens, N Collaert, R Rooyackers, ...
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers., 168-169, 2006
40 2006 Influence of the gas mixture on the reactive ion etching of InP in -H2 plasmas Y Feurprier, C Cardinaud, G Turban
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997
39 1997 Inductively coupled plasma etching of HgCdTe using a CH4 -based mixture E Laffosse, J Baylet, JP Chamonal, G Destefanis, G Cartry, C Cardinaud
Journal of electronic materials 34, 740-745, 2005
37 2005