Sergey Zaitsev
Sergey Zaitsev
IMT RAS, laboratory head
Verified email at iptm.ru
Title
Cited by
Cited by
Year
Viscous flow simulation in nanoimprint using coarse-grain method
V Sirotkin, A Svintsov, S Zaitsev, H Schift
Microelectronic engineering 83 (4-9), 880-883, 2006
332006
Coarse-grain method for modeling of stamp and substrate deformation in nanoimprint
V Sirotkin, A Svintsov, H Schift, S Zaitsev
Microelectronic Engineering 84 (5-8), 868-871, 2007
272007
Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation
N Kehagias, V Reboud, CMS Torres, V Sirotkin, A Svintsov, S Zaitsev
Microelectronic Engineering 85 (5-6), 846-849, 2008
252008
Fabrication of digital rainbow holograms and 3-D imaging using SEM based e-beam lithography
A Firsov, A Firsov, B Loechel, A Erko, A Svintsov, S Zaitsev
Optics Express 22 (23), 28756-28770, 2014
232014
Quantitative comparison of X-ray fluorescence microtomography setups: Standard and confocal collimator apparatus
M Chukalina, A Simionovici, S Zaitsev, CJ Vanegas
Spectrochimica Acta Part B: Atomic Spectroscopy 62 (6-7), 544-548, 2007
232007
Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint
V Sirotkin, A Svintsov, S Zaitsev, H Schift
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
132007
FIB sputtering optimization using Ion Reverse Software
A Svintsov, S Zaitsev, G Lalev, S Dimov, V Velkova, H Hirshy
Microelectronic engineering 86 (4-6), 544-547, 2009
82009
Optimization of droplets for UV-NIL using coarse-grain simulation of resist flow
V Sirotkin, A Svintsov, S Zaitsev
Alternative Lithographic Technologies 7271, 72712I, 2009
62009
X-ray optics for phase differential contrast: Design, optimization, simulation, fabrication
V Aristov, M Chukalina, A Firsov, T Ishikawa, S Kikuta, Y Kohmura, ...
AIP Conference Proceedings 507 (1), 554-557, 2000
62000
3D ion multibeam processing with the CHARPAN PMLP tool and with the single ion-beam FIB tool optimized with the IonRevSim software
S Zaitsev, A Svintsov, C Ebm, S Eder-Kapl, H Loeschner, E Platzgummer, ...
Alternative Lithographic Technologies 7271, 72712P, 2009
22009
The IMPRINT software: quantitative prediction of process parameters for successful nanoimprint lithography
N Kehagias, V Reboud, CM Sotomayor Torres, V Sirotkin, A Svintsov, ...
Proc. Nanotech. Conf 3, 2008
22008
The IMPRINT software: quantitative predictions of the residual resist thickness in nanoimprint
N Kehagias, V Reboud, CMS Torres, V Sirotkin, A Svintsov, S Zaitsev
2007 Digest of papers Microprocesses and Nanotechnology, 404-405, 2007
22007
Simulation of uncharged dislocation EBIC contrast at high excitation level
NN Negulyaev, EB Yakimov, SI Zaitsev
physica status solidi (c) 2 (6), 1822-1826, 2005
22005
Refined coarse-grain modeling of stamp deformation in nanoimprint lithography
S Merino, A Retolaza, A Juarros, H Schift, V Sirotkin, A Svintsov, S Zaitsev
Nsti Nanotech 2008 1, 368-370, 2008
12008
UV-NIL with optimal droplets
V Sirotkin, A Svintsov, S Zaitsev
Nanotechnology, 559-562, 2008
12008
Apparatus and computer X-ray tomography: Visualization of intrinsic structure, evaluation of performance and limitations
M Chukalina, S Zaitsev, D Nikolaev, A Simionovici, M Knyazev, ...
European Conference on Modelling and Simulation, Riga, Latvia, 294-299, 2005
12005
Methods for 3D photonic structures fabrication
S Zaitsev, M Knyazev, S Dubonos, A Bazhenov
2004 24th International Conference on Microelectronics (IEEE Cat. No …, 2004
12004
True color rainbow hologram, OVD, micro-nanooptics... by s/w “RainBow” via high throughput EBL, Dot-Matrix and DLW
A Svintsov, S Zaitsev
Голография. Наука и практика, 89-90, 2016
2016
Germanium‐Based Circular Zone Plates for Soft and Hard X‐Rays
A Firsov, R Belkhou, M Idir, A Svintsov, S Zaitsev, L Ferlazzo, E Cambril
AIP Conference Proceedings 1365 (1), 84-87, 2011
2011
Optimal resist dispensing in step and flash NIL
V Sirotkin, A Svintsov, S Zaitsev
2007 Digest of papers Microprocesses and Nanotechnology, 406-407, 2007
2007
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