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Larissa Juschkin
Larissa Juschkin
Professor for Experimental Physics of EUV, RWTH Aachen University and Forschungszentrum Jülich
Verified email at rwth-aachen.de - Homepage
Title
Cited by
Cited by
Year
Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
T Krücken, K Bergmann, L Juschkin, R Lebert
Journal of Physics D: Applied Physics 37 (23), 3213, 2004
922004
Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
K Bergmann, SV Danylyuk, L Juschkin
Journal of Applied Physics 106 (7), 2009
512009
EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
L Juschkin, R Freiberger, K Bergmann
Journal of Physics: Conference Series 186 (1), 012030, 2009
512009
Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
S Danylyuk, P Loosen, K Bergmann, H Kim, L Juschkin
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (3), 033002-033002, 2013
442013
Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography
S Brose, S Danylyuk, L Juschkin, C Dittberner, K Bergmann, J Moers, ...
Thin solid films 520 (15), 5080-5085, 2012
412012
Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis
M Banyay, L Juschkin
Applied Physics Letters 94 (6), 2009
412009
EUV emission from Kr and Xe capillary discharge plasmas
L Juschkin, A Chuvatin, SV Zakharov, S Ellwi, HJ Kunze
Journal of Physics D: Applied Physics 35 (3), 219, 2002
412002
Comparison of different source concepts for EUVL
R Lebert, K Bergmann, L Juschkin, O Rosier, W Neff
Emerging Lithographic Technologies V 4343, 215-225, 2001
362001
Ptychographic imaging with a compact gas–discharge plasma extreme ultraviolet light source
M Odstrcil, J Bußmann, D Rudolf, R Bresenitz, J Miao, WS Brocklesby, ...
Optics letters 40 (23), 5574-5577, 2015
312015
X-ray lasing as a result of an induced instability in an ablative capillary discharge
SS Ellwi, L Juschkin, S Ferri, HJ Kunze, KN Koshelev, E Louis
Journal of Physics D: Applied Physics 34 (3), 336, 2001
302001
Status of EUV-lamp development and demonstration of applications
R Lebert, C Wies, B Jaegle, L Juschkin, U Bieberle, M Meisen, W Neff, ...
Emerging Lithographic Technologies VIII 5374, 943-953, 2004
282004
Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis
S Brose, J Tempeler, S Danylyuk, P Loosen, L Juschkin
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 043502-043502, 2016
272016
Metrology tools for EUVL-source characterization and optimization
MC Schuermann, T Missalla, KR Mann, S Kranzusch, RM Klein, ...
Emerging Lithographic Technologies VII 5037, 378-388, 2003
242003
Laser triggered Z-pinch broadband extreme ultraviolet source for metrology
I Tobin, L Juschkin, Y Sidelnikov, F O’reilly, P Sheridan, E Sokell, ...
Applied Physics Letters 102 (20), 2013
222013
Pinch plasma radiation sources for the extreme ultraviolet
W Neff, K Bergmann, O Rosier, R Lebert, L Juschkin
Contributions to Plasma Physics 41 (6), 589-597, 2001
222001
Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies
D Wilson, D Rudolf, C Weier, R Adam, G Winkler, R Frömter, S Danylyuk, ...
Review of scientific instruments 85 (10), 2014
212014
Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces
S Danylyuk, S Herbert, P Loosen, R Lebert, A Schäfer, J Schubert, ...
physica status solidi (c) 12 (3), 318-322, 2015
202015
Fractional Talbot lithography with extreme ultraviolet light
H Kim, W Li, S Danylyuk, WS Brocklesby, MC Marconi, L Juschkin
Optics letters 39 (24), 6969-6972, 2014
182014
Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
S Danylyuk, H Kim, S Brose, C Dittberner, P Loosen, T Taubner, ...
Journal of Vacuum Science & Technology B 31 (2), 2013
182013
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
I Mochi, S Fernandez, R Nebling, U Locans, R Rajeev, A Dejkameh, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (1), 014002-014002, 2020
172020
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