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Sumit Agarwal
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Mechanism of hydrogen-induced crystallization of amorphous silicon
S Sriraman, S Agarwal, ES Aydil, D Maroudas
Nature 418 (6893), 62-65, 2002
4782002
The 2022 Plasma Roadmap: low temperature plasma science and technology
I Adamovich, S Agarwal, E Ahedo, LL Alves, S Baalrud, N Babaeva, ...
Journal of Physics D: Applied Physics 55 (37), 373001, 2022
1782022
Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide
VR Rai, V Vandalon, S Agarwal
Langmuir 26 (17), 13732-13735, 2010
1132010
Area-selective deposition of ruthenium by combining atomic layer deposition and selective etching
MFJ Vos, SN Chopra, MA Verheijen, JG Ekerdt, S Agarwal, WMM Kessels, ...
Chemistry of Materials 31 (11), 3878-3882, 2019
1022019
Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
RA Ovanesyan, EA Filatova, SD Elliott, DM Hausmann, DC Smith, ...
Journal of Vacuum Science & Technology A 37 (6), 2019
982019
Well ordered polymer melts from blends of disordered triblock copolymer surfactants and functional homopolymers
VR Tirumala, A Romang, S Agarwal, EK Lin, JJ Watkins
Advanced Materials 20 (9), 1603-1608, 2008
962008
Absolute densities of N and excited in a plasma
S Agarwal, B Hoex, MCM Van de Sanden, D Maroudas, ES Aydil
Applied physics letters 83 (24), 4918-4920, 2003
952003
Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
RA Ovanesyan, DM Hausmann, S Agarwal
ACS Applied Materials & Interfaces 7 (20), 10806-10813, 2015
832015
Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionization mass spectrometry
S Agarwal, GWW Quax, MCM Van de Sanden, D Maroudas, ES Aydil
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004
782004
Effect of silicon oxide thickness on polysilicon based passivated contacts for high-efficiency crystalline silicon solar cells
AS Kale, W Nemeth, SP Harvey, M Page, DL Young, S Agarwal, ...
Solar Energy Materials and Solar Cells 185, 270-276, 2018
772018
Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 113 (30), 12962-12965, 2009
752009
Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone
VR Rai, V Vandalon, S Agarwal
Langmuir 28 (1), 350-357, 2012
732012
Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 112 (26), 9552-9554, 2008
712008
Tin-catalyzed plasma-assisted growth of silicon nanowires
SJ Rathi, BN Jariwala, JD Beach, P Stradins, PC Taylor, X Weng, Y Ke, ...
The Journal of Physical Chemistry C 115 (10), 3833-3839, 2011
702011
In situ gas-phase hydrosilylation of plasma-synthesized silicon nanocrystals
BN Jariwala, OS Dewey, P Stradins, CV Ciobanu, S Agarwal
ACS applied materials & interfaces 3 (8), 3033-3041, 2011
672011
Threshold ionization mass spectrometry of reactive species in remote Ar∕ C2H2 expanding thermal plasma
J Benedikt, S Agarwal, D Eijkman, W Vandamme, M Creatore, ...
Journal of Vacuum Science & Technology A 23 (5), 1400-1412, 2005
652005
Mesoporous silica films with long-range order prepared from strongly segregated block copolymer/homopolymer blend templates
VR Tirumala, RA Pai, S Agarwal, JJ Testa, G Bhatnagar, AH Romang, ...
Chemistry of Materials 19 (24), 5868-5874, 2007
632007
Understanding the charge transport mechanisms through ultrathin SiOx layers in passivated contacts for high-efficiency silicon solar cells
AS Kale, W Nemeth, H Guthrey, E Kennedy, AG Norman, M Page, ...
Applied Physics Letters 114 (8), 2019
582019
Abstraction of atomic hydrogen by atomic deuterium from an amorphous hydrogenated silicon surface
S Agarwal, A Takano, MCM Van De Sanden, D Maroudas, ES Aydil
The Journal of chemical physics 117 (23), 10805-10816, 2002
552002
Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozone
VR Rai, S Agarwal
Chemistry of Materials 23 (9), 2312-2316, 2011
532011
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